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  UV lamp
  The UV Cleaning System is designed with environment and personnel required no solvent, which has been adopted in diversified production processes such as electric, automobile, and semiconductor. Utilization of ultraviolet radiation through a lower-pressure mercury lamp and excimer lamp is conductive to ecology. Elimination of organic substances and improvement in adherability and adhesion are actualized without thermal and humid damage to an object being irradiated.
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  Inline
  UV cleaning system
  Designed according to the production line and operation type, and successive UV cleaning is enabled.
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  Batch
  UV cleaning system
  A compact and lightweight system that actualizes easy UV cleaning intended for production and experiment.

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  Dielectric film
  light modifying system
  Modifies the dieletric film of the electrodes patterned inside the liquid crystal glasses.
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  Light cleaning treatment system
  Irradiates ultraviolet radiation for cleaning in wettability prior to applying films such as PI film. Used for residue elimination after resist separation.
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  EB irradiation system
  Utilizing electron beam irradiation, the system contributes to new materials development and research projects in pursuit of high added values.

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  Ozonizer
  High concentration ozonizer with ceramic electrodes. Used for semiconductor oxide film generation and liquid crystal glass cleaning.
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  All In One & Separable & Conveyable Excimer UV cleaning system
  High-quality and high-speed cleaning is actualized through the utilization of strong ultraviolet radiation and ozone from the excimer lamp.

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